Title:
GAS-BARRIERING TRANSPARENT FILM
Document Type and Number:
Japanese Patent JP3148383
Kind Code:
B2
Abstract:
PURPOSE: To obtain transparency, gas barrier properties and excellent flexibility by forming the layer of silicon oxide containing carbon and fluorine at specific rates on at least one surface on a transparent high-molecular film and acquiring transmittance at a specific rate or more to light having a specific wavelength.
CONSTITUTION: The layer of silicon oxide containing carbon and fluorine is laminated on at least one surface on a transparent high-molecular film, thus manufacturing a gas-barriering film having transmittance of 75% or more to light having a wavelength of 400nm-800nm. 5at.%-40at.%, is desirable as the total quantity of carbon and fluorine comprised in silicon oxide, and 5at.%-20at.%, is more desirable. The thickness of the layer of silicon oxide is kept within a range of 20nm-500nm, and the gas-barriering film composed of polyester or polyether sulfone is used as the transparent high-molecular film.
Inventors:
Shin Fukuda
Nobuhiro Fukuda
Nobuhiro Fukuda
Application Number:
JP21136192A
Publication Date:
March 19, 2001
Filing Date:
August 07, 1992
Export Citation:
Assignee:
Mitsui Chemicals, Inc.
International Classes:
B32B9/04; B32B9/00; C08J7/04; C23C16/40; (IPC1-7): B32B9/00; C08J7/04; C23C16/40
Domestic Patent References:
| JP623903A |