Title:
GAS CONTROL SYSTEM, FILM DEPOSITION APPARATUS INCLUDING GAS CONTROL SYSTEM, PROGRAM USED FOR GAS CONTROL SYSTEM AND GAS CONTROL METHOD
Document Type and Number:
Japanese Patent JP2018150572
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To easily control the total amount of a material gas drawn from a tank.SOLUTION: A gas control system includes a controller 60 for introducing a carrier gas into a tank 10 having a stored material, drawing a material gas obtained by vaporizing the material from the tank 10 together with the carrier gas and controlling the flow rate of the carrier gas so that a concentration index value obtained by measuring the mixed gas drawn from the tank 10 and directly or indirectly showing a material gas concentration in the mixed gas approaches a predetermined target concentration index value. The controller 60 performs the first control controlled so that the flow rate of the carrier gas changes at a predetermined rate of change and subsequently performs the second control controlling the flow rate of the carrier gas on the basis of deviation between the concentration index value and the target concentration index value.SELECTED DRAWING: Figure 1
Inventors:
SAKAGUCHI YUHEI
SHIMIZU TORU
MINAMI MASAKAZU
HAYASHI DAISUKE
SHIMIZU TORU
MINAMI MASAKAZU
HAYASHI DAISUKE
Application Number:
JP2017046224A
Publication Date:
September 27, 2018
Filing Date:
March 10, 2017
Export Citation:
Assignee:
HORIBA LTD
International Classes:
C23C16/455; C23C16/448; G05D21/00; H01L21/31
Domestic Patent References:
| JP2004091917A | 2004-03-25 | |||
| JP2014196537A | 2014-10-16 | |||
| JP2014530673A | 2014-11-20 |
Attorney, Agent or Firm:
Ryuhei Nishimura
Saito Shindai
Uemura Yoshinaga
Saito Shindai
Uemura Yoshinaga