To provide an apparatus which perfectly dissolves a gas fed to pure water of a small flow rate, and produces gas dissolved water having a stable specific resistance value of ≤1 MΩ cm.
In the gas dissolved water producing apparatus 11, a gas is injected into a pure water inflow pipe of feeding pure water to produce gas dissolved water in which the gas is dissolved at a fixed concentration. The apparatus includes: a T-type conduit 12; a gas feed pipe 15 which is inserted from one socket of the T-type conduit to the position of the center of a T-type joining part and in which a base part is sealed; a pure water inflow pipe 13 of feeding pure water vertically in a direction to be fed with the gas from the other one socket of the T-type conduit; and a pure water outflow pipe 14 composed of a first pure water outflow pipe 14a connected to one socket not provided by both of the gas feed pipe 15 and pure water inflow pipe 13 of the T-type conduit, and the second pure water outflow pipe 14c connected to the downstream of the first pure water outflow pipe 14a.
SHINOZAKI HIROYUKI
UENISHI MITSUHIKO
JP3139460U | 2008-02-21 | |||
JP2005028306A | 2005-02-03 | |||
JP2011230062A | 2011-11-17 | |||
JP2003117570A | 2003-04-22 | |||
JPH09150166A | 1997-06-10 | |||
JP2000334283A | 2000-12-05 | |||
JP2010274181A | 2010-12-09 | |||
JP2001230062A | 2001-08-24 | |||
JP2001327958A | 2001-11-27 | |||
JP2008036557A | 2008-02-21 | |||
JP2011152513A | 2011-08-11 | |||
JPH10324502A | 1998-12-08 | |||
JP2011143368A | 2011-07-28 | |||
JP2010533582A | 2010-10-28 | |||
JP2006247469A | 2006-09-21 | |||
JPH0699167A | 1994-04-12 | |||
JP3066199U | 2000-02-18 |
Next Patent: GAS DISSOLVED WATER PRODUCING APPARATUS AND METHOD THEREOF