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Title:
GAS DIVERSION SUPPLY DEVICE AND GAS DIVERSION SUPPLY METHOD USING THE SAME
Document Type and Number:
Japanese Patent JP2013178709
Kind Code:
A
Abstract:

To prevent an occurrence of gas overshoot in a diversion path when introducing gases in a gas diversion supply device for performing diversion supply of gas flow from a pressure flow rate controller through a plurality of diversion paths.

A gas diversion supply device is provided with: a pressure flow rate controller 4; a plurality of diversion paths L1 to Ln which are connected in parallel and perform diversion supply of gases from the pressure flow rate controller 4 to a process chamber 15; thermal type flow rate sensors 6a to 6n mediated in the respective diversion paths L1 to Ln; motor-operated valves 7a to 7n provided on the downstream side of the thermal flow rate sensors 6a to 6n; and switching controllers 16a to 16n for controlling opening/closing of the respective motor-operated valves 7a to 7n. The switching controllers 16a to 16n are switchable between valve opening degree control for holding the motor-operated valves 7a to 7n by a valve opening degree control command signal Sp to a prescribed fixed valve opening degree and diversion flow rate control for adjusting opening degree of the motor-operated valves 7a to 7n by feedback control based on a flow rate detection signal Sm of the thermal type flow rate sensor 6 by a diversion flow rate control command signal Ss.


Inventors:
SAWADA YOHEI
IKEDA SHINICHI
DOI RYOSUKE
NISHINO KOJI
Application Number:
JP2012043090A
Publication Date:
September 09, 2013
Filing Date:
February 29, 2012
Export Citation:
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Assignee:
FUJIKIN KK
International Classes:
G05D7/06
Domestic Patent References:
JPH06318116A1994-11-15
JP2000305630A2000-11-02
JPH10240352A1998-09-11
JPH09217898A1997-08-19
JP2004005308A2004-01-08
JPH06318116A1994-11-15
JP2000305630A2000-11-02
Attorney, Agent or Firm:
Takeshi Sugimoto
Yata Ryuichi