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Title:
GAS EJECTION TREATMENT APPARATUS
Document Type and Number:
Japanese Patent JP2012112540
Kind Code:
A
Abstract:

To restrain the wall of a housing from reaching a high temperature in a gas ejection treatment apparatus that ejects hot air from above and below a treatment object.

The gas ejection treatment apparatus includes: a housing; a conveyer 20 having air permeability and conveying a treatment object W in the housing; and a plurality of upper nozzles 40a/lower nozzles 40b which are disposed in an upper chamber 30a/lower chamber 30b positioned above/below the conveyer 20, respectively, and eject gas inside the respective chambers 30a/30b to an upper part and a lower part. The lower chamber 30b has a protruding part 30bx protruding toward a wall 11a or the like, with the edge of the upper chamber 30a in a side of the wall 11a or the like as a reference. The protruding part 30bx includes a lower protruding part nozzle 40bx as a part of the lower nozzles 40b. The lower protruding part nozzle 40bx has a cylindrical shape directed from the upper face of the lower chamber 30b to the inside of the chamber.


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Inventors:
ARAKAWA MASAYOSHI
Application Number:
JP2010259496A
Publication Date:
June 14, 2012
Filing Date:
November 19, 2010
Export Citation:
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Assignee:
ARAKAWA SEISAKUSHO KK
International Classes:
F26B15/18
Domestic Patent References:
JPH10234345A1998-09-08
JP2000146401A2000-05-26
JPS60136775U1985-09-11
JPS49121173U1974-10-17
JPS60138195U1985-09-12
JPH0766100A1995-03-10
JPS4214730Y11967-08-23
JP2004335838A2004-11-25
JPS57179094U1982-11-12
JPH02154973A1990-06-14
JP2000161850A2000-06-16
JP2003090681A2003-03-28
JP2008538807A2008-11-06
Attorney, Agent or Firm:
Tetsuya Hasegawa