Title:
GAS FEEDING DEVICE
Document Type and Number:
Japanese Patent JP2568365
Kind Code:
B2
Abstract:
PURPOSE: To facilitate the demounting of a flow rate control valve and efficiently susbstitute the gas left in the flow rate control valve.
CONSTITUTION: A gas feeding device is constituted of a unit device equipped with an inlet valve 2 and an outlet valve 3 which cut off the flow of the corrosive gas Fa, flow rate control valve 5 for controlling the flow rate of the corrosive gas Fa between the inlet valve 2 and the outlet valve 3, purge valve 6 for feeding the substitution gas N into the flow rate control valve 5, and an ejector valve 7 connected with an ejector 4 for decompressing the corrosive gas Fa in the flow rate control valve 5, and the flow rate control valve 5 is screw-tightened from the upper direction for the unit, and the ejector 4 is positioned in the vicinity of the flow rate control valve 5, and the working fluid of the ejector 4 serves as substitution gas.
Inventors:
View Yuichi
Yoshihisa Sudo
Kenichi Goto
Hiroshi Itoh
Akihiro Kojima
Yoshihisa Sudo
Kenichi Goto
Hiroshi Itoh
Akihiro Kojima
Application Number:
JP4592993A
Publication Date:
January 08, 1997
Filing Date:
February 10, 1993
Export Citation:
Assignee:
Toshiba Corporation
CKD Corporation
CKD Corporation
International Classes:
F17D1/02; H01L21/302; H01L21/3065; (IPC1-7): F17D1/02; H01L21/3065
Domestic Patent References:
| JP5203100A |
Attorney, Agent or Firm:
Takashi Tomizawa (2 outside)