ガス導入構造、処理装置及び処理方法 - 東京エレクトロン株式会社

Title:

ガス導入構造、処理装置及び処理方法

Document Type and Number:

Japanese Patent JP7097809

Kind Code:

B2

Abstract:

A gas introduction structure includes: a gas introduction pipe inserted in a process chamber; and a discharge part covering an end portion of the gas introduction pipe at a side of the process chamber, and configured to discharge a gas supplied to the gas introduction pipe into the process chamber, wherein the discharge part includes a porous portion formed of a porous body, and a dense portion disposed at a location closer to a leading end of the discharge part than the porous portion and having a porosity lower than that of the porous portion.

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Inventors:

Ishii victory

Application Number:

JP2018248239A

Publication Date:

July 08, 2022

Filing Date:

December 28, 2018

Export Citation:

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Assignee:

東京エレクトロン株式会社

International Classes:

H01L21/31; C23C16/455; H01L21/205

Domestic Patent References:

JP2008091489A
JP2004277757A

Attorney, Agent or Firm:

Tadashige Ito
Tadahiko Ito

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