Title:
ガスレーザ装置
Document Type and Number:
Japanese Patent JP6378460
Kind Code:
B2
Abstract:
A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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Inventors:
Suzuki Natsushi
Wakabayashi Osamu
Hiroro Sakuma
Masanori Yashiro
Wakabayashi Osamu
Hiroro Sakuma
Masanori Yashiro
Application Number:
JP2018042453A
Publication Date:
August 22, 2018
Filing Date:
March 08, 2018
Export Citation:
Assignee:
Gigaphoton Co., Ltd.
International Classes:
H01S3/225
Domestic Patent References:
| JP2010092920A |
Foreign References:
| US5073896 |
Attorney, Agent or Firm:
Hosaka Enju