Title:
ガスマニホールド、リソグラフィ装置用モジュール、リソグラフィ装置、及びデバイス製造方法
Document Type and Number:
Japanese Patent JP5328866
Kind Code:
B2
Abstract:
A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.
Inventors:
Van, Boxtel, Frank, Johannes, Jacobs
Van Damme, Marinus, Johannes, Maria
Jasper, Johannes, Cristian, Maria
Van der ham, ronald
Shrepov, Sergey
Pieters, Gelben
Maragona, Varagona
Debrower, Peter
Van dersteen, antonius, arnolds, henricas
Van Damme, Marinus, Johannes, Maria
Jasper, Johannes, Cristian, Maria
Van der ham, ronald
Shrepov, Sergey
Pieters, Gelben
Maragona, Varagona
Debrower, Peter
Van dersteen, antonius, arnolds, henricas
Application Number:
JP2011224983A
Publication Date:
October 30, 2013
Filing Date:
October 12, 2011
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F7/20; H01L21/027
Domestic Patent References:
| JP10012517A | ||||
| JP11154643A | ||||
| JP2000252668A | ||||
| JP2008118135A |
Foreign References:
| WO2000022656A1 | ||||
| WO2003105203A1 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki