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Title:
GAS PROCESSING DEVICE, GAS PROCESSING CARTRIDGE, AND GAS PROCESSING METHOD
Document Type and Number:
Japanese Patent JP2014079750
Kind Code:
A
Abstract:

To provide a gas processing device having excellent processing capacity.

A gas processing device 1 comprises: a first processing chamber 15; a second processing chamber 16; and a processing agent 17 for processing a gas. A processed gas is introduced into the first processing chamber 15. The gas is introduced from the first processing chamber 15 into the second processing chamber 16. A gas which has been processed is exhausted from the second processing chamber 16. The processing agent 17 is disposed in the first and second processing chambers 15, 16. A first processing chamber 15 side end part of the second processing chamber 16 is formed as a hollow space.


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Inventors:
TOKUURA SHIZUO
YOSHIDA TAKASHI
HOTTA KAZUHIKO
MINEMURA NORIMICHI
YURIZONO HIDETSUGU
Application Number:
JP2013153523A
Publication Date:
May 08, 2014
Filing Date:
July 24, 2013
Export Citation:
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Assignee:
UBE INDUSTRIES
International Classes:
B01D53/68; H01L21/3065
Domestic Patent References:
JPH11114360A1999-04-27
JPS63315126A1988-12-22
JP2010120807A2010-06-03
JPS57501564A1982-09-02
JPH08332348A1996-12-17
Attorney, Agent or Firm:
Kazutoshi Nakayama



 
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