Title:
GAS PROCESSING DEVICE, GAS PRODUCTION SYSTEM, AND POWER GENERATING SYSTEM
Document Type and Number:
Japanese Patent JP2018192458
Kind Code:
A
Abstract:
To provide a gas processing device for efficiently processing a gas and a gas production system.SOLUTION: A gas processing device 1 has a plenty of through-holes 20 where a gas flows and an alpha-ray emitter is fixed to the inner flank of the through-hole 20. Dispersing means 12 is arranged at the center of the inlet face on which the openings of the through-holes 20 are formed, the dispersing means serving to disperse the gas arriving at the gas processing device 1 from the central part to the peripheral part. A plurality of the through-holes 20 are formed so as to surround the dispersing means 12 in a plurality stages. The through-holes 20 located in the farthest stage from the dispersing means 12 have a larger opening cross-section than the opening cross section of the through-holes 20 located in the nearest stage from the dispersing means 12.SELECTED DRAWING: Figure 1
Inventors:
HAYASHI YOSHINOBU
Application Number:
JP2017100999A
Publication Date:
December 06, 2018
Filing Date:
May 22, 2017
Export Citation:
Assignee:
HAYASHI YOSHINOBU
International Classes:
B01J19/12; F02M27/04
Attorney, Agent or Firm:
Fumihiko Yagisawa
Takeshi Sato
Takeshi Sato