GAS PURIFICATION APPARATUS

Japanese Patent JP2006016439

A

To provide a gas purification apparatus which can compactly purify a raw gas containing sulfur impurities and organic silicon impurities at a low cost.

The gas purification apparatus 10 is constituted of an adsorption tower 11, a blower 16, valves 18a-18c and the like for passing the raw gas 1 from the lower side to the upper side of the adsorption tower 11, a blower 16 and valves 19a, 19b and the like for evacuating the adsorption tower 11, an organic silicon impurities-adsorbent 12 for adsorbing the organic silicon impurities 1a arranged in the adsorption tower 11 so as to divide the adsorption tower 11 into the lower side and the upper side, and a sulfur impurities-adsorbent 13 for adsorbing the sulfur impurities 1b arranged in the adsorption tower 11 so as to divide the adsorption tower 11 into the lower side and the upper side, and the organic silicon impurities-adsorbent 12 is any one of MCM-41, USY, MCM-48 and USM while the sulfur impurities-adsorbent 13 is silicalite.

WO/2021/035753	GAS HYDRATE PRESSURE-MAINTAINING REPLACEMENT APPARATUS AND METHOD USED FOR IN-SITU RAMAN ANALYSIS
JP2000503293	INDUSTRIAL APPLICABILITY: A method for removing sulfur-containing pollutants, aromatic compounds and hydrocarbons from a gas.
JP5492943	Deoxidizing method and equipment for digestive gas

SATO JUN
HONDA HIROKI
TERASAWA YOSHINORI
HORIZOE KOJI
YOSHIDA SUEO
HAMADA AKIHIRO
KUMAGAI MIKIRO
IZUMI JUN

JP2004193281A

January 19, 2006

June 30, 2004

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MITSUBISHI HEAVY IND LTD
INST RES & INNOVATION

C10L3/10; B01D53/04; B01J20/18; B09B3/00; C02F11/04

Toshiro Mitsuishi
Tadahiro Mitsuishi
Yasuyuki Tanaka
Hiroshi Matsumoto

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