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Title:
ガス精製装置及びその制御方法、並びに水素製造装置
Document Type and Number:
Japanese Patent JP6937087
Kind Code:
B2
Abstract:
To provide a gas purification apparatus and a control method for the same in which time required for purified gas to reach predetermined purity can be reduced at the time of starting the gas purification apparatus, and a hydrogen production apparatus.SOLUTION: During operation of starting a PSA apparatus 40, a first adsorption tower 102, a second adsorption tower 104 and a hydrogen gas storage tank 106 are shut off to prevent hydrogen gas having not reached predetermined purity from being stored in the hydrogen gas storage tank 106. Further during the operation of starting, the first adsorption tower 102 performing an adsorption step is communicated with the second adsorption tower 104 performing a desorption step to supply hydrogen gas from the first adsorption tower 102 to the second adsorption tower 104, which can prompt separation of impurities in the adsorption tower performing the desorption step. This can reduce time required for purity of the hydrogen gas purified to reach predetermined purity at the time of starting the PSA apparatus 40.SELECTED DRAWING: Figure 14

Inventors:
Kohei Eguchi
Kushi Takuto
Application Number:
JP2019151454A
Publication Date:
September 22, 2021
Filing Date:
August 21, 2019
Export Citation:
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Assignee:
Tokyo Gas Co., Ltd.
International Classes:
B01D53/047; C01B3/38; C01B3/56
Domestic Patent References:
JP2015100752A
JP2017206421A
JP2001279267A
Foreign References:
WO2017146271A1
Attorney, Agent or Firm:
Patent Service Corporation Taiyo International Patent Office