Title:
GAS REACTION METHOD AND GAS REACTION DEVICE
Document Type and Number:
Japanese Patent JP2023086331
Kind Code:
A
Abstract:
To provide a gas reaction method and a gas reaction device capable of reducing the energy required for the reaction of source gas.SOLUTION: A gas reaction method according to an embodiment of the present invention comprises changing source gas into plasma and bringing the source gas in the plasma state into contact with a catalyst to induce a chemical reaction of the source gas in the plasma state.SELECTED DRAWING: Figure 1
Inventors:
TORII JUNJI
Application Number:
JP2021200767A
Publication Date:
June 22, 2023
Filing Date:
December 10, 2021
Export Citation:
Assignee:
NGK INSULATORS LTD
International Classes:
C01B3/26; C01B3/56; C01B32/05
Attorney, Agent or Firm:
Takafumi Momii
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