To provide a gas reforming apparatus which efficiently makes harmful substances harmless using OH radicals.
In this apparatus, pulse voltage or alternating voltage is applied by a power source 8 to ionize a part of a gas-molecule into plasma, an electrode pair 4 is so arranged that the plasma is exposed to the gas inside a duct 2, the ions in the plasma are drawn out against the air flow toward the upper stream side at a low speed using a first grid electrode 3 to form a cluster bonded with water-molecules and harmful substances around the ion as the core. This cluster is returned by the gas flow to the electrode pair 4 and flowed in the plasma, and by promoting the dissociation of the water-molecules due to collision of the electrons in the plasma and the clusters, the production volume of OH radicals is increased.
NAKAO AKIO
Shiro Terasaki
Yoshiki Kuroki
Next Patent: GAS REFORMING APPARATUS