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Title:
GAS REPLACING METHOD FOR LOW TEMPERATURE LIQUEFIED GAS TANK
Document Type and Number:
Japanese Patent JP2000170997
Kind Code:
A
Abstract:

To provide a gas replacing method for a low temperature liquefied gas tank without consuming large quantity of gaseous nitrogen, capable of replacing residual gas by gaseous nitrogen in a short time and reducing mixing of gaseous nitrogen in residual gas.

Vaporized gas remaining in an empty low temperature liquefied gas tank 1 from which stored liquid is extracted is replaced with vaporized gas in separate low temperature liquefied gas tank 1' in operation, next, gaseous nitrogen 9 is supplied from the lower part of the empty low temperature liquefied gas tank 1 and residual gas of an upper layer is replaced with gaseous nitrogen of a lower layer by a piston flow.


Inventors:
ASAI OSAMU
Application Number:
JP34512298A
Publication Date:
June 23, 2000
Filing Date:
December 04, 1998
Export Citation:
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Assignee:
ISHIKAWAJIMA HARIMA HEAVY IND
International Classes:
F17C9/00; (IPC1-7): F17C9/00
Attorney, Agent or Firm:
Minoru Hotta (1 person outside)



 
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