Title:
GAS SUPPLY APPARATUS
Document Type and Number:
Japanese Patent JP2017029006
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a gas supply apparatus that can purge a space containing a sample with a gas at a predetermined temperature in a short time and contribute to the measurement and evaluation of the sample, while being unnecessary to use a member having heat resistance for piping, etc.SOLUTION: A gas supply apparatus 1 is configured such that a pipe line 50 connects between a gas-receiving port 23 to which a gas is supplied from a gas supply source 2 and a chamber 3 for storing a sample. The pipe line 50 is provided with an electromagnetic on-off valve 24, a flow-regulating valve 25, a flow meter 12, a humidifying mechanism 26, and a fluid heater 40. A temperature sensor 41 is provided in the fluid heater 40. In addition, a temperature sensor 27 for detecting the temperature of the gas ejected from the fluid heater 40 is attached to the fluid heater 40.SELECTED DRAWING: Figure 2
Inventors:
SUDO FUMIO
KOAMI TAKESHI
WADA MATSUJIRO
OBATA KAZUNORI
SAOTOME HIDEO
ZUSHIDA YASUSHI
KOAMI TAKESHI
WADA MATSUJIRO
OBATA KAZUNORI
SAOTOME HIDEO
ZUSHIDA YASUSHI
Application Number:
JP2015149306A
Publication Date:
February 09, 2017
Filing Date:
July 29, 2015
Export Citation:
Assignee:
TECH WORK CO LTD
IPS PORTAL INC
IPS PORTAL INC
International Classes:
C12M1/08
Attorney, Agent or Firm:
Takashi Otsubo
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