Title:
GAS SUPPLY DEVICE
Document Type and Number:
Japanese Patent JP2703694
Kind Code:
B2
Abstract:
PURPOSE: To accurately control the supply rate of a source gas per unit time within a short time by controlling the flow rate of a mixed gas corresponding to the difference between the flow rate of the source gas which is obtained from the product of the concn. of the source gas calculated from both the flow rate of a carrier gas to be mixed with source gas and the flow rate of the mixed gas by operation and the preset flow rate of the source gas.
CONSTITUTION: In a gas supply device constituted so that a liquid source 6 is stirred by passing carrier gas through the liquid source 6 to be gasified and the formed source gas is supplied in a constant amount, the flow rate of the carrier gas is measured by a carrier gas flow rate measuring part 3 and a mixed gas flow rate measuring part 4 measures the flow rate of the mixed gas consisting of the carrier gas and the source gas. Further, a mixed gas flow rate control valve 4 controls the flow rate of the mixed gas. An operational control part 5 controls the valve 4 corresponding to the difference between the flow rate of the source gas which is obtained from the product of the concn. of the source gas calculated from both the flow rate of the carrier gas and the flow rate of the mixed gas by operation and the preset flow rate of the source gas.
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Inventors:
TOMITA MUNENORI (JP)
Application Number:
JP16222592A
Publication Date:
January 26, 1998
Filing Date:
May 28, 1992
Export Citation:
Assignee:
SHINETSU HANDOTAI KK (JP)
International Classes:
B01J4/02; G05D7/06; G05D11/13; (IPC1-7): B01J4/02
Domestic Patent References:
| JP222472A | ||||
| JP2268826A |
Attorney, Agent or Firm:
Yoshio Arafune
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