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Title:
GAS SUPPLY SYSTEM AND GAS SUPPLY METHOD
Document Type and Number:
Japanese Patent JP2014000571
Kind Code:
A
Abstract:

To provide a gas supply system and a gas supply method in which a pressure difference can be sufficiently minimized in a system having various levels of vacuum suction pressure.

A gas supply system 100 operating in the atmospheric pressure environment is equipped with: a reaction chamber 250 which mixes plasma flow, powder particles, and conditioning fluid to alter the powder particles and form mixture flow; a gas supply chamber 215 connected to the reaction chamber 250; an intake air generator 270 which generates suction force at an output port 258 of the reaction chamber 250; a conditioning fluid supply module which supplies conditioning fluid at original pressure; and a pressure adjusting module which, despite that the conditioning fluid is supplied at the original pressure from the conditioning fluid supply module and suction force at the output port 258 of the reaction chamber 250 is changed, reduces the pressure of the conditioning fluid from the original pressure to a pressure selected to atmospheric pressure and supplies conditioning fluid of the selected pressure to the gas supply chamber 215.


Inventors:
FREDERICK P LAYMAN
Application Number:
JP2013168600A
Publication Date:
January 09, 2014
Filing Date:
August 14, 2013
Export Citation:
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Assignee:
SDCMATERIALS INC
International Classes:
B01J4/00; B01J7/02; B01J19/08; F17C7/04
Domestic Patent References:
JP2007138287A2007-06-07
JPH05193909A1993-08-03
JPH03226509A1991-10-07
JPH06172820A1994-06-21
JPH0234707A1990-02-05
JPH026339A1990-01-10
JPS4931571A1974-03-22
JPH09141087A1997-06-03
Attorney, Agent or Firm:
Akira Koike
Seiji Iga
Toshiya Fujii



 
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