Title:
GAS TREATING DEVICE
Document Type and Number:
Japanese Patent JP2003010625
Kind Code:
A
Abstract:
To provide a gas treating device capable of regenerating an adsorption member for adsorbing components to be treated such as a harmful component and an odor component contained in the gas to be treated and reducing a running cost required for the treatment.
In the gas treating device 1, the components to be treated desorbed from the adsorption member 2a are treated by a low temperature plasm produced by a discharge. A regeneration and a decomposition are carried out by an action of various active species (for example, hydroxyl radicals, excitation oxygen molecule, or the like) generated at this time. A catalyst means can also be used and a cost can be suppressed without carrying out heating with a heater for the regeneration.
Inventors:
KAGAWA KENKICHI
MOGI KANJI
TANAKA TOSHIO
MOGI KANJI
TANAKA TOSHIO
Application Number:
JP2001200409A
Publication Date:
January 14, 2003
Filing Date:
July 02, 2001
Export Citation:
Assignee:
DAIKIN IND LTD
International Classes:
A61L9/16; A61L9/22; B01D53/04; B01D53/06; B01D53/32; (IPC1-7): B01D53/04; A61L9/16; A61L9/22; B01D53/06; B01D53/32
Domestic Patent References:
| JPH11319489A | 1999-11-24 | |||
| JPH10202038A | 1998-08-04 | |||
| JP2000325734A | 2000-11-28 |
Attorney, Agent or Firm:
Hiroshi Maeda (7 outside)