To improve calculation accuracy of a lithography simulator.
A database generation method has a step S1002, in which an effective light-source shape is calculated, while changing a plurality of conditions settable in an illumination optical system so as to generate an initial database, showing the effective light-source shape; a step S1004 for measuring the effective light-source shape by setting an arbitrary condition of the plurality of conditions in the illumination optical system; a step S1006 for calculating the residual-error amount between the effective light-source shape, when each of the plurality of conditions is set in the illumination optical system and the effective light-source shape included in the database, on the basis of the effective light-source shape measured in the measurement step and the effective light-source shape, belonging to the initial database generated in the generation step and corresponding to arbitrary condition; and a step S1010 for correcting the effective light-source shape included in the initial database, by using the residual-error amount calculated in the calculation step so as to use the corrected initial database as an actual database.
TSUJITA KOICHIRO
MIKAMI KOJI
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu