GENERATION OF PARTICLE BEAM AND MEASUREMENT AND CONTROL OF PARTICLE BEAM CHARACTERISTIC

Title:

GENERATION OF PARTICLE BEAM AND MEASUREMENT AND CONTROL OF PARTICLE BEAM CHARACTERISTIC

Document Type and Number:

Japanese Patent JP2000223436

Kind Code:

A

Abstract:

To provide an ion implantation apparatus and a method which are capable of controlling the characteristics of a particle beam by changing its aperture in size.

A particle beam 40 is generated by an equipment that contains a particle source and directed to the surface of a work for processing. A Faraday cup assembly 60 is arranged so as to shut off a particle beam 40, and the characteristics of the particle beam are measured. The Faraday cup assembly 60 is equipped with a Faraday cup 62, which collects electrical charge and an aperture assembly 70 equipped with an aperture 72 which enables charged particles to pass through, so as to reach the Faraday cup 62. The Faraday cup 62 is arranged with respect to the aperture assembly 70 so as to block the charged particles. The aperture assembly 70 is so constituted as to make the aperture 72 change in size.

Inventors:

MERAN NASA GOGGI

Application Number:

JP30860199A

Publication Date:

August 11, 2000

Filing Date:

October 29, 1999

Export Citation:

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Assignee:

EBARA CORP

International Classes:

H01L21/265; (IPC1-7): H01L21/265

Attorney, Agent or Firm:

Isamu Watanabe (2 outside)

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