Title:
GETTER MATERIAL FOR ELECTRON TUBE AND ITS MANUFACTURE, AND GETTER DEVICE FOR ELECTRON TUBE AND ELECTRON TUBE USING THE GETTER MATERIAL
Document Type and Number:
Japanese Patent JP3619635
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To sputter a sufficient amount of getter member to a large size of electron tube stably, and suppress an ion impact following a getter flush essentially for a large size electron tube, a CDT, and the like using an impregnation type cathode.
SOLUTION: In an electron getter member 1, a getter material 3 including a Ba-Al alloy powder and a Ni powder is filled in a metallic getter container 2. In the Ba-Al alloy powder in the getter material 3, the total content of the carbon, the oxygen, and the nitrogen, is made not more than 0.4wt.%. It is preferable to make the content of the carbon not more than 0.04wt.%, the content of the oxygen not more than 0.35wt.%, and the content of the nitrogen not more than 0.01wt.%, and particularly, it is more favorable to make the content of the carbon not more than 0.02wt.%, and the content of the oxygen not more than 0.10wt.%.
Inventors:
Tadashi Okai
Nakayama Shoji
Orimoto Yoshiki
Naoki Kato
Nihei Hideharu
Nakayama Shoji
Orimoto Yoshiki
Naoki Kato
Nihei Hideharu
Application Number:
JP9266797A
Publication Date:
February 09, 2005
Filing Date:
April 11, 1997
Export Citation:
Assignee:
Toshiba Corporation
International Classes:
H01J9/39; H01J7/18; H01J29/94; (IPC1-7): H01J7/18; H01J29/94
Domestic Patent References:
| JP52147963A | ||||
| JP62143349A | ||||
| JP6103932A | ||||
| JP7176278A |
Attorney, Agent or Firm:
Saichi Suyama
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