To provide a method of forming through pores having highly controlled pore diameter precision and having no working deterioration layers on the inner wall faces on a glass substrate.
In the glass substrate having fine pores, the boundary parts between the side wall faces of the fine pores and the surface of the glass substrate are connected by curved surfaces. Further, working deterioration layers are removed from the surfaces of the inner wall faces of the fine pores, and the boundary parts between the wall faces and the glass substrate surface. The fine pores are produced by piercing fine pores on the glass substrate by mechanical working or laser working, and thereafter subjecting the glass substrate and the surfaces of the fine pores to liquid phase chemical etching. At this time, an etching solution used for the liquid phase chemical etching desirably consists of a hydrofluoric acid aqueous solution or a mixed aqueous solution of hydrofluoric acid and ammonium fluoride.
ARAMO KATSUHIDE
HIKICHI NAOKO
