To provide a polishing method for a glass substrate for an information recording medium capable of polishing to improve quality without lowering productivity and without raising the working cost.
In a first polishing process P5 of this polishing method for a glass substrate for an information recording medium, a combination of a load (pressure) to be applied to a main surface of the glass substrate by a polish pad, the number of relational rotation of the main surface and the polish pad, and a mean granular diameter of the abrasive grains is fixed. A second grinding process P6 is formed of two stages of processes having a different combination of the pressure, the number of relational rotation and the mean granular diameter of the abrasive grains.
NAKANO YOZO
SHIMIZU YOICHIRO
Next Patent: POLISHING PAD