Title:
多金属デバイス処理のためのグルコン酸含有フォトレジスト洗浄組成物
Document Type and Number:
Japanese Patent JP4903242
Kind Code:
B2
Abstract:
A microelectronic photoresist cleaning composition suitable for cleaning multi-metal microelectronic devices and to do so without any substantial or significant galvanic corrosion occurring when there is a subsequent rinsing step employing water.
Inventors:
Seiji Inaoka
Application Number:
JP2009110155A
Publication Date:
March 28, 2012
Filing Date:
April 28, 2009
Export Citation:
Assignee:
J T BAKER INCORPORATED
International Classes:
H01L21/304; C11D7/26; C11D7/32; C11D7/34; C11D17/08; G03F7/42; H01L21/027
Domestic Patent References:
| JP2008509554A | ||||
| JP2007514983A | ||||
| JP2008537182A | ||||
| JP2008198994A |
Attorney, Agent or Firm:
Hidesaku Yamamoto
Takaaki Yasumura
Natsuki Morishita
Takaaki Yasumura
Natsuki Morishita