GRADATION PATTERN FORMATION METHOD AND FORMATION DEVICE THEREOF

Title:

GRADATION PATTERN FORMATION METHOD AND FORMATION DEVICE THEREOF

Document Type and Number:

Japanese Patent JP2003089061

Kind Code:

A

Abstract:

To provide a gradation pattern formation method and a formation device thereof capable of forming a light diffusion face preventing the occurrence of bright unevenness and luminescent point on a light guiding plate or a light guiding plate formation mold.

In this gradation pattern formation method for changing surface roughness by scattering many minute recessed parts by performing scanning treatment of sand blast for injecting an injection material from a nozzle by high pressure gas for a surface of a workpiece, an injection amount of the injection material is controlled to a predetermined flow rate by a fixed amount supply device 3, and scanning treatment is performed while changing at least one out of scanning pitch of the nozzle 4 or the workpiece 6, scanning speed, injection pressure, and an injection distance between the nozzle and the workpiece to change surface roughness linearly or curvedly from one end of the workpiece to the other end thereof.

Inventors:

IZAWA MORIYASU
OGIWARA NAOYUKI
WATABE NOBORU

Application Number:

JP2001278338A

Publication Date:

March 25, 2003

Filing Date:

September 13, 2001

Export Citation:

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Assignee:

SINTOBRATOR LTD

International Classes:

G02B6/00; B24C1/04; B24C3/32; B29C59/00; (IPC1-7): B24C1/04; B24C3/32; B29C59/00; G02B6/00

Domestic Patent References:

JPH10268137A	1998-10-09
JP2002122742A	2002-04-26
JPH06143143A	1994-05-24

Foreign References:

US4093754A

1978-06-06

Attorney, Agent or Firm:

Tatsuo Watanuki (2 outside)

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