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Title:
GRAFT POLYMERIZATION METHOD FOR POLYMERIC BASE MATERIAL
Document Type and Number:
Japanese Patent JP3761789
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a simple and practical vapor phase graft polymerization method in which the problem of uneven graft is eliminated by eliminating problems with regard to the vapor phase graft polymerization.
SOLUTION: The vapor phase graft polymerization method includes the step of bringing an irradiated organic polymeric base material into contact with the vapor of a polymerizable monomer to carry out a graft polymerization. The graft polymerization reaction is carried out in the state where the polymeric base material is folded or wound with a space between the adjacent polymeric base materials.


Inventors:
Takanobu Sugo
Noriaki Seko
Kunio Fujiwara
Application Number:
JP2001046526A
Publication Date:
March 29, 2006
Filing Date:
February 22, 2001
Export Citation:
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Assignee:
Japan Atomic Energy Research Institute
Ebara Corporation
International Classes:
B01D39/00; C08J7/18; B01D39/16; D06M14/26; D06M14/28; C08L101/00; (IPC1-7): C08J7/18; B01D39/00; B01D39/16; D06M14/28; //C08L101:00
Domestic Patent References:
JP47016573A
Attorney, Agent or Firm:
Kazuo Shamoto
Tadahiko Kurita
Shurin Sakurai
Kiyoshi Murakami
Shinya Hosokawa
Takako Koiso