PURPOSE: To efficiently correct the arrangement of a plate with simple operation, by constituting the titled system so that the plate which has been generated once can be aligned at once an auxiliary line which is generated optionally.
CONSTITUTION: When coordinate points P1WP4 of block frames 65a, 65b are picked with a stylus pen 61a, respectively, and also, a horizontal moving command is inputted, the block frames 65a, 65b move horizontally so as to be opposed to an auxiliary line 66a, and also, so that the coordinate points P1WP4 of the block frames 65a, 65b place on the auxiliary line 66a. Also, when the coordinate points P1WP4 of the block frames 65a, 65b are picked with a stylus pen 61b, respectively, and also, the horizontal moving command is inputted, the block frames 65a, 65b move horizontally so as to be opposed to an auxiliary line 66b, and also, so that the coordinate points P1WP4 of the block frames 65a, 65b place on the auxiliary line 66b. In this regard, the circumferential shape of the auxiliary line is equally well.
| JPS63210844 | EXPOSURE MASK |
| JPH0265151 | LINE WIDTH LOSS MEASURING METHOD |
| JPS6254919 | MANUFACTURE OF X-RAY EXPOSING MASK |
TSUNASHIMA KAZUYA
YANASE AKIO
