Title:
リソグラフィック投影装置及びデバイス製造方法
Document Type and Number:
Japanese Patent JP4090449
Kind Code:
B2
Abstract:
A rectangular or bar-shaped, on-axis illumination mask with radiation polarized parallel to the length of the bar provides improved depth of focus (DOF) and exposure latitude with less lens heating as compared to a circular monopole with equivalent sigma .
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Inventors:
Stephan George Sunsen
Donis George Flagello
Michael Francoise Hubert Classen
Loylentius Cornelius de Winterth
Etwin Wilhelms Marie Knolls
Donis George Flagello
Michael Francoise Hubert Classen
Loylentius Cornelius de Winterth
Etwin Wilhelms Marie Knolls
Application Number:
JP2004104522A
Publication Date:
May 28, 2008
Filing Date:
March 31, 2004
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G02B5/18; H01L21/027; G03F7/20
Domestic Patent References:
| JP9218518A | ||||
| JP6118623A | ||||
| JP7183201A | ||||
| JP7288222A | ||||
| JP5275315A | ||||
| JP2002289505A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Shinji Oga
Toshifumi Onuki