Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
GRINDER AND GRINDING METHOD OF WAFER
Document Type and Number:
Japanese Patent JP2009095947
Kind Code:
A
Abstract:

To prevent an impact force at the start of grinding and the micro vibration of a grinding stone during grinding from being transmitted to a wafer when grinding the wafer by bringing the grinding stone into contact with the wafer.

This grinder comprises at least: a grinding means 19 having a chuck table for holding the wafer, the grinding stone 230 constituted in such a manner that a grinding stone part 230b for grinding the wafer which is held to the chuck table is fixed to a wheel base 230a, and a wheel mount 210 for supporting the wheel base 230a; and a grinding feeding means which makes the grinding means 19 approach the chuck table and separate therefrom. Damping rubber 220 whose repulsion resilience specified in JIS K6255 is 2% to 4% is interposed between the wheel base 230a and the wheel mount 210, and thus the impact force at the start of the grinding and the micro vibration of the grinding stone 230 during grinding are absorbed.


Inventors:
YAMAMOTO SETSUO
Application Number:
JP2007271123A
Publication Date:
May 07, 2009
Filing Date:
October 18, 2007
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
DISCO ABRASIVE SYSTEMS LTD
International Classes:
B24B45/00; B24B7/22; B24D7/00
Domestic Patent References:
JP2005335014A2005-12-08
JPH0727754U1995-05-23
Attorney, Agent or Firm:
Isao Sasaki
Kyoko Kawamura
Ken Kubo