Title:
システム安定性を向上できるＨＡＢＩ類光開始剤及びその応用
Document Type and Number:
Japanese Patent JP7311920
Kind Code:
B2
Abstract:
An HABI photoinitiator capable of improving system stability, having a structure shown in general formula (I). In the structure, a biimidazole compound has 2-1', 2-3', 2'-1, and 2'-3 attachment sites; the total percentage by mass of the biimidazole compound having the four attachment sites is more than 92%, and a ratio of the sum of the content of the compound at the 2-1' and 2'-1 attachment sites to the sum of the content of the compound at the 2-3' and 2'-3 attachment sites is between 1.5:1-2:1. When the photoinitiator is controllable in performance and applied to a photosensitive resin composition, the composition and a dry film thereof have excellent storage stability, and do not likewise have a tendency that sensitivity and resolution are reduced subsequent to being stored for a long time. The present invention also relate to the photosensitive resin composition comprising the photoinitiator and an application thereof.
Inventors:
Qian Qian
Application Number:
JP2021569578A
Publication Date:
July 20, 2023
Filing Date:
May 22, 2020
Export Citation:
Assignee:
CHANGZHOU ZHENGJIE INTELLIGENT MANUFACTURE TECHNOLOGY CO., LTD
International Classes:
C08F4/00; B01J13/16; C07D233/64; C08F2/48; C08F220/04; C08F220/12; G03F7/004; G03F7/027; G03F7/029; G03F7/031; G03F7/033; H05K1/03
Domestic Patent References:
| JP10036354A | ||||
| JP2015087429A | ||||
| JP2017181646A | ||||
| JP2010122381A | ||||
| JP10072447A | ||||
| JP2007003789A | ||||
| JP10300922A |
Attorney, Agent or Firm:
Buna International Patent Office
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