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Title:
HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK
Document Type and Number:
Japanese Patent JP2004004791
Kind Code:
A
Abstract:

To provide a halftone phase shift mask etc., which copes with different two inspection wavelengths in inspection using reflection and make it possible to obtain sufficient inspection accuracy even when either of the inspection wavelengths is used.

The phase shifter films of the halftone phase shift mask blank consist of multilayered films laminated with at least two or more layers including the upper layer formed on the most surface side and the lower layer formed thereunder and is adjusted in the film thickness of the upper layer in such a manner that the refractive index of the film of the upper layer for the wavelength of the inspection light used for the halftone phase shift mask manufactured by using the halftone phase shift mask blank is smaller than the refractive index of the film of the lower layer and that the surface reflectivity for the inspection light of the phase shifter films turns to the desired reflectivity for the different two or more inspection wavelengths.


Inventors:
SHIODA YUUKI
NOZAWA JUN
MITSUI HIDEAKI
Application Number:
JP2003116566A
Publication Date:
January 08, 2004
Filing Date:
April 22, 2003
Export Citation:
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Assignee:
HOYA CORP
International Classes:
G03F1/29; G03F1/32; G03F1/58; G03F1/68; H01L21/027; (IPC1-7): G03F1/08; H01L21/027
Domestic Patent References:
JPH07134392A1995-05-23
JPH0381769A1991-04-08
JP2002229177A2002-08-14
JP2004004488A2004-01-08
JP2003248291A2003-09-05
JP2001174973A2001-06-29
JPH10307382A1998-11-17
JPH06342205A1994-12-13
Attorney, Agent or Firm:
Yasuo Fujimura



 
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