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Patent Searching and Data


Title:
Hard mask
Document Type and Number:
Japanese Patent JP6186225
Kind Code:
B2
Abstract:
Compositions containing certain organometallic oligomers suitable for use as spin-on, metal hardmasks are provided, where such compositions can be tailored to provide a metal oxide hardmask having a range of etch selectivity. Also provided are methods of depositing metal oxide hardmasks using the present compositions.

Inventors:
Dayan Wang
Givin Sun
Pan-Wai Chang
Peter Trefonas The Third
Gong Liu
Application Number:
JP2013196367A
Publication Date:
August 23, 2017
Filing Date:
September 24, 2013
Export Citation:
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Assignee:
Rohm and Haas Electronic Materials LLC
International Classes:
C08F2/00; C08F20/06; C08G79/00; H01L21/027
Domestic Patent References:
JP2007521355A
JP2014532289A
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office