Title:
HEAT DECOMPOSITION TREATMENT METHOD FOR HALOGEN ATOM- CONTAINING ORGANIC COMPOUND
Document Type and Number:
Japanese Patent JP3450323
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a heat decomposition treatment method which can heat- decompose a halogen atom-containing organic compound while minimizing the discharge of a halogen component (particularly chlorine) and benzene to the outside of a system.
SOLUTION: In this heat decomposition treatment method for the halogen atom-containing organic compound, the halogen atom-containing organic compound, is heated together with soil to 300 to 600°C in the presence of metal oxide particles and water to eliminate the halogen component from the halogen atom-containing organic compound. The halogen component is captured in a mixture of the soil with the metal oxide particles. The mixture is then melted to fix the halogen component in the melt, and the organic compound, from which the halogen component has been eliminated, is reduced and thermally decomposed.
Inventors:
Yasufuku, Toshiaki
Terada, Takahiko
Kikawada, Kazuya
Terada, Takahiko
Kikawada, Kazuya
Application Number:
JP2002000308341
Publication Date:
July 11, 2003
Filing Date:
October 23, 2002
Export Citation:
Assignee:
ISV JAPAN:KK
International Classes:
A62D3/32; A62D3/33; A62D3/34; A62D3/37; A62D3/40; B09B3/00; B09C1/06; C02F11/10; C07B35/06; C07B37/06; C07C23/12; C07C23/20; C07D319/24; A62D101/04; A62D101/08; A62D101/22; A62D101/28; (IPC1-7): B09C1/06; A62D3/00