Title:
HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL
Document Type and Number:
Japanese Patent JP3949967
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material having such photographic characteristics as low fog, high Dmax (maximum density), high sensitivity and high contrast and less liable to increase fog even when the photosensitive material after processing is stored over a long period of time.
SOLUTION: In the heat developable photosensitive material having a non- photosensitive organic silver salt, photosensitive silver halide, a reducing agent for silver ions and a binder on one face of the base, at least one compound of the formula (X)k-(L)m-(A-B)n and at least one compound imagewise generating a chemical species capable of forming development starting points on the non- photosensitive organic silver salt and in its vicinities are contained. In the formula, X is a silver halide attracting group or a light absorbing group; L is a (k+ n)-valent linking group; A is an electron donative group; B is a releasable group or H; A-B forms a radical A' when released or deprotonated after oxidation; (k) is an integer of 0-3; (m) is 0 or 1; and (n) is 1 or 2.
Inventors:
Tetsuo Yamaguchi
Application Number:
JP2002007064A
Publication Date:
July 25, 2007
Filing Date:
January 16, 2002
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03C1/498; (IPC1-7): G03C1/498
Domestic Patent References:
| JP11305387A | ||||
| JP11149136A | ||||
| JP2000284399A |
Attorney, Agent or Firm:
Patent Service Corporation Patent Office Sykes
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