Title:
HEAT EMISSION LIGHT SOURCE
Document Type and Number:
Japanese Patent JP2021150190
Kind Code:
A
Abstract:
To provide a heat emission light source which can be installed in a state where a substrate and a heat emission layer are exposed in atmosphere, has a large emissivity in a wavelength of larger than 4 μm and 8 μm or smaller, and has a small emissivity in a wavelength of larger than 8 μm.SOLUTION: In an emission control part Na, a heat emission layer N and a substrate K heating the heat emission layer N are laminated, and a MIM lamination part M that the heat radiation layer N makes a resonance transparent oxide layer R formed with a transparent oxide position between platinum layers P arranged along a lamination direction is provided. In a formation that it is positioned at the side close to the substrate K in order of a discharge transparent oxide layer Nb formed by the transparent oxide, it is structured in a state where the emission control part Na and the discharge transparent oxide layer Nb are laminated. The thickness of the resonance transparent oxide layer R is 1200 nm or larger and 1500 nm or smaller, in which the region of larger than 4 μm and 8 μm or smaller is set as a resonance wavelength region.SELECTED DRAWING: Figure 1
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Inventors:
SUEMITSU MASAHIRO
Application Number:
JP2020049246A
Publication Date:
September 27, 2021
Filing Date:
March 19, 2020
Export Citation:
Assignee:
OSAKA GAS CO LTD
International Classes:
H05B3/10; H01K1/02; H05B3/12; H05B3/46
Attorney, Agent or Firm:
Patent business corporation r&c