PURPOSE: To provide a device for forming a functional film with high precision, particularly for uniformly forming a film on a substrate having a large area at high throughput and a method thereof in a method and device for generating a heat plasma and a display device in the case where the film is formed by plasma spraying, heat plasma CVD, or the like.
CONSTITUTION: A film forming device comprises a depthwise elongated cathode 15 provided with a powder or gas supplying path 17 in the center and a cooler inside, an anode 21 surrounded by a plasma operating gas space 19 and forming a plasma jetting port having a flat slit shaped cross section downstream of the tip 18 of the cathode 15, and a magnetic field generating endless magnet 28 acting approximately perpendicularly to an arc column 26 generated between the operating gas space 19 side beyond the center of the tip 18 of the cathode 15 and the anode of the plasma jetting port.
SHINTAKU HIDENOBU
SHIRATORI TETSUYA
MITANI TSUTOMU
Next Patent: PLASMA DISPLAY PANEL AND MANUFACTURE THEREOF