To provide a heat-resistant transparent barrier film which increases the adhesion of a plastic base material and a vapor deposition film, optically controls the film quality itself of the vapor deposition film, optimally controls the film quality itself of the vapor deposition film and is not deteriorated in capacity even at sterilization treatment such as retort treatment or the like.

Pretreatment utilizing plasma of a reactive ion etching (RIE) mode is applied to at least one side of a base material comprising a plastic material and a highly oxidized aluminum compound vapor deposition film comprising AlxOy [1.5<(y/x)<=3.0] with a thickness of 5-100 nm is provided on the pretreated surface of the base material.