Title:
HEAT TREATING APPARATUS
Document Type and Number:
Japanese Patent JP3860404
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To improve the temperature uniformity of a ring member 5 in heat treatment to avoid damaging the ring member.
SOLUTION: A ring heating controller 81 controls a straight pipe-like heating light source 10 located above a ring member 5 for mainly heating the ring member 5 provided for improving the temperature uniformity of a substrate W in a heat treating apparatus. The controller 81 divides the heating light source 10 above the ring member 5 into an inside part and an outside part and individually controls the inside part and the outside part in stages of heat treating process, thereby improving the temperature uniformity of the ring member 5 during heat treating of the substrate W.
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Inventors:
Nishihara Hideo
Toshiyuki Kobayashi
Yasuhiro Shiba
Toshiyuki Kobayashi
Yasuhiro Shiba
Application Number:
JP2000296430A
Publication Date:
December 20, 2006
Filing Date:
September 28, 2000
Export Citation:
Assignee:
Dainippon Screen Mfg. Co., Ltd.
International Classes:
H01L21/26; H05B3/00; C03B29/02; C03B32/00; F27D5/00; F27D11/02; F27D19/00; H01L21/205; (IPC1-7): H01L21/26; C03B32/00; F27D5/00; F27D11/02; F27D19/00; H01L21/205; H05B3/00
Domestic Patent References:
JP917741A |
Attorney, Agent or Firm:
Shigeaki Yoshida
Yoshitake Hidetoshi
Takahiro Arita
Yoshitake Hidetoshi
Takahiro Arita