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Title:
HEAT TREATMENT APPARATUS
Document Type and Number:
Japanese Patent JP2010133666
Kind Code:
A
Abstract:

To improve a heat treatment apparatus performing heat treatment of a glass substrate so as to develop a heat treatment apparatus capable of facilitating maintenance.

A substrate replacement system 18 is arranged at an approximately center of a heat treatment chamber 12, and a placement shelf 16 is provided in the substrate replacement system 18. All step parts 23 of the placement shelf 16 have lack parts 37 where small beams 31 at central portions are lacked, and an open ceiling part 38 is formed by the lack parts 37. A worker can enter into the open ceiling part 38.

COPYRIGHT: (C)2010,JPO&INPIT


Inventors:
KANDA TOSHIRO
Application Number:
JP2008311525A
Publication Date:
June 17, 2010
Filing Date:
December 05, 2008
Export Citation:
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Assignee:
ESPEC CORP
International Classes:
F27D5/00; F27B5/06; F27B17/00; F27D1/18; F27D3/06; F27D3/12; F27D7/04
Domestic Patent References:
JP2010133647A
JP2003165735A
JP2006046894A
JP2007139234A
JP2002195762A
JP2008032274A
JPH0712468A
JP2004340514A
JP2007333272A
JPH0763875A
JP2007326686A
Attorney, Agent or Firm:
藤田 隆