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Patent Searching and Data


Title:
HEAT TREATMENT EQUIPMENT
Document Type and Number:
Japanese Patent JP2004319754
Kind Code:
A
Abstract:

To provide compact heat treatment equipment exhibiting excellent maintainability.

A lamp house 5 contains 27 flush lamps 69 while arranging, at a constant interval, along a horizontal direction (X direction) perpendicular to the longitudinal direction thereof which is parallel with a horizontal direction (Y direction). Carrying direction of a semiconductor wafer W by a carrying robot 150 is set perpendicular to the longitudinal direction of the flush lamp 69 (longitudinal direction of the lamp house 5). With such an arrangement, the distance required for the carrying robot 150 to slide a carrying arm 151a and to deliver the semiconductor wafer W is minimized. Since the carrying robot 150 is made compact, heat treatment equipment 100 itself is made compact and its maintainability is enhanced.


Inventors:
Murayama, Hiromi
Application Number:
JP2003000111558
Publication Date:
November 11, 2004
Filing Date:
April 16, 2003
Export Citation:
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Assignee:
DAINIPPON SCREEN MFG CO LTD
International Classes:
H01L21/22; B60Q11/00; F27B5/14; F27B17/00; F27D11/00; F27D11/02; H01L21/00; H01L21/26; (IPC1-7): H01L21/26; H01L21/22