To provide a heat treatment equipment capable of shortening the distance to make illumination distribution become broad by making illumination distribution in a surface of a panel-shape object to be heated such as a semi-conductor wafer and the like be even in its radial direction.
For a sheet-shape heating device 1 provided with a heating circle 4 including a lamp and a resistance heater and the like on concentric circular shape, the panel-shape object 5 to be heated is positioned to face with it and rotate. A rotation center C2 of the panel-shape object 5 to be heated is relatively shifted from a center C1 of an arc of a heating source circle group of the sheet-shape heating device and decentered so that temperature difference in the surface of the panel-shape object 5 to be heated is mitigated in a process of the panel-shape object 5 to be heated passing through high and low zones at different temperatures.
ISHIZU HIDEO
Aniya Setsuo
Hitoshi Kiyono