Title:
HEAT TREATMENT STAND AND PRODUCTION METHOD OF CERAMICS ELECTRONIC PARTS
Document Type and Number:
Japanese Patent JP2002211991
Kind Code:
A
Abstract:
To provide a heat treatment stand which enables the suppression of the diffusion of substance from the object to be heat-treated into a base material, and enables the performance of stable heat treatment from the start of use.
The surface of a base material 3 consisting of a mullite based material is provided with a first coat layer 1 consisting of high purity Al2O3, and further, the surface of the first coat layer 1 is provided with a second coat layer 2 essentially consisting of ZrO2, so that the coat layers have a plural layer structure. Further, the content of Al2O3 in the first coat layer 1 is controlled to ≥95%, thickness to 50 to 300 μm, and porosity to ≤15%.
Inventors:
KAWAHARA TOSHINORI
NISHIYAMA TOSHIKI
HOSOKAWA TAKAO
YONEDA YASUNOBU
NISHIYAMA TOSHIKI
HOSOKAWA TAKAO
YONEDA YASUNOBU
Application Number:
JP2001000775A
Publication Date:
July 31, 2002
Filing Date:
January 05, 2001
Export Citation:
Assignee:
MURATA MANUFACTURING CO
International Classes:
C04B41/89; C04B35/64; C04B41/52; (IPC1-7): C04B41/89; C04B35/64
Attorney, Agent or Firm:
Nishizawa Hitoshi
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