HEAT TREATMENT SYSTEM AND HEAT TREATMENT METHOD

Title:

HEAT TREATMENT SYSTEM AND HEAT TREATMENT METHOD

Document Type and Number:

Japanese Patent JP2002252220

Kind Code:

A

Abstract:

To properly perform heat treatment without the heat treatment affected by change with time and change in outside environment.

Each of heaters is independently powered, and the temperature of objects to be treated in a zone defined by each heater is controlled so as to correspond to a set point previously programmed, for film forming to be performed. When the film forming is finished, the set point for each zone is updated according to an equation 1: a new set point for each zone = the former set point for the same zone - [a thickness of a film formed in the same zone -an average thickness of films formed in the all zones] × the difference between the latest set point and the former set point/the difference between the thickness of film in the latest film forming and the thickness of film in the former film forming].

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METHOD AND DEVICE FOR CONTINUOUSLY FEEDING ALKALI IN CHEMICAL TREATMENT PLANT

Inventors:

SAKAMOTO KOICHI
O BUNRYO
PARK YOUNG-CHUL
SUZUKI FUJIO
TAKENAGA YUICHI
OBARA ASAKI
ITO NAOHIDE

Application Number:

JP2001316638A

Publication Date:

September 06, 2002

Filing Date:

October 15, 2001

Export Citation:

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Assignee:

TOKYO ELECTRON LTD

International Classes:

B01J19/00; F27B5/18; F27D19/00; G05D23/30; H01L21/31; (IPC1-7): H01L21/31; B01J19/00; G05D23/30

Attorney, Agent or Firm:

Kimura Mitsuru

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