To improve temperature uniformity on a mask substrate in heating and cooling in relation to a heating and cooling method for manufacturing a photomask and a heating and cooling system, in which the mask substrate is heated and cooled after predetermined treatment in the manufacture of the photomask.

The method is constructed as follows: after a lapse of a predetermined time period since start of heating of the mask substrate with a heating unit, a periphery of the mask substrate is covered with a frame portion, and simultaneously a thermo-reflection member is positioned on the upper side of the mask substrate and baking is conducted (S5-S8); and after a lapse of a predetermined time period since start of cooling of the mask substrate, on which the frame portion etc. have been arranged and are still remaining after completion of the baking, with a cooling unit, the frame portion etc. are detached from the mask substrate, and the cooling is continued (S25-S28).