PURPOSE: To realize exposure wherein the line width irregularity of a particle beam aligner is little and the distortion of an image is small, or to accurately obtain the height of an object of a multilayered structure to be detected.
CONSTITUTION: A P-polarized light 10 is converged and projected on the surface of an object to be detected or an object 3 to be exposed, at an incident angle equal to the Brewster angle θb, and the position of a reflected light 20 is detected with a position detector 21. When the thickness of resist is known, correction is performed by its value so that the accuracy is further improved. A large detection error of height is not caused by a very little thickness change of the uppermost layer (resist) 31 of a multilayered structure, and the above purpose can be surely attained.
| JPS58196835 | 【考案の名称】XYステ-ジ |
| JPS6232463 | MASK FOR EXPOSURE |
MATSUOKA GENYA
IWASAKI TERUO
KANEKO NORIO
