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Title:
ヘテロ環含有ヨードニウム塩
Document Type and Number:
Japanese Patent JP4345730
Kind Code:
B2
Abstract:
Heterocyclic sulfonium and iodonium salts with chromone or xanthone groups are new. Heterocyclic sulfonium and iodonium salts of formula [S(Ph 1>)(Ph 2>)R] +>A (1) and [R 2>6>-I-R 2>7>] +>A 3(35) are new. Ph 1>, Ph 2>phenyl (optionally substituted by 1-5 of R 1>) R : a group of formula (2) or (3); R, R 3>-R 6>halo, alkyl, haloalkyl, aralkyl, aryl, haloaryl or alkylaryl; X 2>-X 4>O or S; A, A 3anion derived from halogen, strong inorganic acid, organic acid or HM 1(R 7>) 4; M 1B or Ga; R 7>aryl (optionally substituted by lower haloalkyl, halo, nitro and cyano); R 2>6>a group of formula (2) or (3); R 2>7>alkyl, haloalkyl, aralkyl or a group of formula (2) or (3); and when R 2>7>alkyl, haloalkyl or aralkyl, then A 3is an anion derived from a strong inorganic acid of formula HM 3F 6(5), organic acid or HM 1(R 7>) 4; M 3P, As or Sb; i : 0-4; j,q : 0-3; p : 0-2. Independent claims are also included for (1) photocationic polymerization initiators comprising (1) or (35a) (as for (35) except that when R 2>7>= alkyl, haloalkyl or aralkyl, then the strong acid is (5)); (2) a method of polymerizing epoxy or vinyl ether monomers using (1) or (35a) as polymerization initiator; (3) acid-generating agent for a resist, containing (1) or (35a).

Inventors:
Ishihara Masami
Youji Urano
Masahiro Takahashi
Application Number:
JP2005263288A
Publication Date:
October 14, 2009
Filing Date:
September 12, 2005
Export Citation:
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Assignee:
Wako Pure Chemical Industries, Ltd.
International Classes:
C07D311/16; C07D311/82; C07D311/86; C07D335/06; C08F4/00; C08G59/68; C08G65/10; G03C5/00; G03F7/004; G03F7/029; G03F7/038; G03F7/039
Domestic Patent References:
JP50151996A
JP50158680A
Other References:
Polish J. Chem.,1997年,Vol.71,pp.1236-1245