Title:
へテロレプティック有機金属化合物
Document Type and Number:
Japanese Patent JP2010505002
Kind Code:
A
Abstract:
This invention relates to organometallic compounds represented by the formula (L1)xM(L2)y wherein M is a metal or metalloid, L1 and L2 are different and are each a hydrocarbon group or a heteroatom-containing group; x is a value of at least 1; y is a value of at least 1; x+y is equal to the oxidation state of M; and wherein (i) L1 has a steric bulk sufficiently large such that, due to steric hinderance, x cannot be a value equal to the oxidation state of M, (ii) L2 has a steric bulk sufficiently small such that, due to lack of steric hinderance, y can be a value equal to the oxidation state of M only in the event that x is not a value of at least 1, and (iii) L1 and L2 have a steric bulk sufficient to maintain a heteroleptic structure in which x+y is equal to the oxidation state of M; a process for producing the organometallic compounds, and a method for producing a film or coating from organometallic precursor compounds.
Inventors:
Mayale, Scott, Houston
Peck, John
Spong, Ronald, F.
Thompson, David, M.
Peck, John
Spong, Ronald, F.
Thompson, David, M.
Application Number:
JP2009530616A
Publication Date:
February 18, 2010
Filing Date:
September 28, 2007
Export Citation:
Assignee:
Praxair Technology Incorporated
International Classes:
C07F7/10; C07F19/00; C23C16/40; C07F5/00; C07F7/00; C07F7/28; C07F9/00; C07F11/00; C07F17/00
Domestic Patent References:
| JPH07502565A | 1995-03-16 | |||
| JPS6216490A | 1987-01-24 | |||
| JP2006182709A | 2006-07-13 | |||
| JP2006013267A | 2006-01-12 | |||
| JP2005132756A | 2005-05-26 | |||
| JP2009541316A | 2009-11-26 |
Foreign References:
| WO2005037847A1 | 2005-04-28 | |||
| WO2005112101A2 | 2005-11-24 | |||
| WO2007066546A1 | 2007-06-14 |
Other References:
JPN5009013672; ＹＵ，Ｘ． ｅｔ ａｌ．: ＪＯＵＲＮＡＬ ＯＦ ＴＨＥ ＡＭＥＲＩＣＡＮ ＣＨＥＭＩＣＡＬ ＳＯＣＩＥＴＹ Ｖ１２６ Ｎ１４, 2004, Ｐ４４７２-４４７３
JPN5009013673; ＣＨＥＮ，Ｔ． ｅｔ ａｌ．: ＩＮＯＲＧＡＮＩＣＡ ＣＨＩＭＩＣＡ ＡＣＴＡ Ｖ３４５, 2003, Ｐ１１３-１２０
JPN5009013674; ＢＵＥＲＧＥＲ，Ｈ． ａｎｄ ＮＥＥＳＥ， Ｈ． Ｊ．: ＩＮＯＲＧＡＮＩＣ ＡＮＤ ＮＵＣＬＥＡＲ ＣＨＥＭＩＳＴＲＹ ＬＥＴＴＥＲＳ Ｖ６ Ｎ３, 1970, Ｐ２９９-３０４
JPN6012032994; ＣＡＩ， Ｈ． ｅｔ ａｌ．: Ｃａｎａｄｉａｎ Ｊｏｕｒｎａｌ ｏｆ Ｃｈｅｍｉｓｔｒｙ Ｖｏｌ．８１， Ｎｏ．１１, 2003, ｐ．１３９８-１４０５
JPN6012032996; ＣＨＡＮＤＲＡ，Ｇ． ａｎｄ ＬＡＰＰＥＲＴ Ｍ． Ｆ．: Ｊｏｕｒｎａｌ ｏｆ ｔｈｅ Ｃｈｅｍｉｃａｌ Ｓｏｃｉｅｔｙ ［Ｓｅｃｔｉｏｎ］ Ａ： Ｉｎｏｒｇａｎｉｃ， Ｐｈｙｓｉｃａｌ， Ｔｈｅｏｒｅｔｉｃａｌ Ｎｏ．８, 1968, ｐ．１９４０-５
JPN5009013673; ＣＨＥＮ，Ｔ． ｅｔ ａｌ．: ＩＮＯＲＧＡＮＩＣＡ ＣＨＩＭＩＣＡ ＡＣＴＡ Ｖ３４５, 2003, Ｐ１１３-１２０
JPN5009013674; ＢＵＥＲＧＥＲ，Ｈ． ａｎｄ ＮＥＥＳＥ， Ｈ． Ｊ．: ＩＮＯＲＧＡＮＩＣ ＡＮＤ ＮＵＣＬＥＡＲ ＣＨＥＭＩＳＴＲＹ ＬＥＴＴＥＲＳ Ｖ６ Ｎ３, 1970, Ｐ２９９-３０４
JPN6012032994; ＣＡＩ， Ｈ． ｅｔ ａｌ．: Ｃａｎａｄｉａｎ Ｊｏｕｒｎａｌ ｏｆ Ｃｈｅｍｉｓｔｒｙ Ｖｏｌ．８１， Ｎｏ．１１, 2003, ｐ．１３９８-１４０５
JPN6012032996; ＣＨＡＮＤＲＡ，Ｇ． ａｎｄ ＬＡＰＰＥＲＴ Ｍ． Ｆ．: Ｊｏｕｒｎａｌ ｏｆ ｔｈｅ Ｃｈｅｍｉｃａｌ Ｓｏｃｉｅｔｙ ［Ｓｅｃｔｉｏｎ］ Ａ： Ｉｎｏｒｇａｎｉｃ， Ｐｈｙｓｉｃａｌ， Ｔｈｅｏｒｅｔｉｃａｌ Ｎｏ．８, 1968, ｐ．１９４０-５
Attorney, Agent or Firm:
Asamura patent office
Hideto Asamura
Hajime Asamura
Katsunori Ando
Yuichiro Asano
Yoichiro Uemura
Hideto Asamura
Hajime Asamura
Katsunori Ando
Yuichiro Asano
Yoichiro Uemura