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Patent Searching and Data


Title:
HIGH BREAKDOWN VOLTAGE FLAT SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP2001274321
Kind Code:
A
Abstract:

To increase dielectric strength and reduce insulation size in a package by selecting a gas having a better insulation property than a nitrogen gas which has been used in the conventional method, for a gas to be enclosed in the package of a flat semiconductor device for power.

In this flat semiconductor device, an IGBT chip 2 and a diode chip 3 are assembled in combination with collector electrodes 7, insulation partition walls 8 and the like in the sealed flat package 1 comprising an outer case (ceramic) 4 and case electrodes 5, 6; and then an insulation is enclosed in the package. For the insulation gas to be enclosed in the package, a carbon dioxide which has a better insulation property than nitrogen and whose leakage gas has no adverse effect on the surrounding areas is used instead of a nitrogen gas which has been used in the conventional method.


Inventors:
TAKANO TETSUMI
Application Number:
JP2000082400A
Publication Date:
October 05, 2001
Filing Date:
March 23, 2000
Export Citation:
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Assignee:
FUJI ELECTRIC CO LTD
International Classes:
H01L25/07; H01L21/54; H01L25/18; H01L29/739; H01L29/78; (IPC1-7): H01L25/07; H01L21/54; H01L25/18; H01L29/78
Attorney, Agent or Firm:
Shoji Shinobe